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Semiconductor Optoelectronics, Volume. 41, Issue 2, 217(2020)

Study of Defect Perturbation in Reflective Field of EUV Mask Multilayer

LI Guannan1...2, LIU Lituo1, ZHOU Weihu1,2,*, SHI Junkai1 and CHEN Xiaomei1 |Show fewer author(s)
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    LI Guannan, LIU Lituo, ZHOU Weihu, SHI Junkai, CHEN Xiaomei. Study of Defect Perturbation in Reflective Field of EUV Mask Multilayer[J]. Semiconductor Optoelectronics, 2020, 41(2): 217

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    Received: Dec. 9, 2019

    Accepted: --

    Published Online: Jun. 17, 2020

    The Author Email: Weihu ZHOU (zhouweihu@ime.ac.cn)

    DOI:10.16818/j.issn1001-5868.2020.02.014

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology