Acta Optica Sinica, Volume. 24, Issue 7, 865(2004)

Optical Performance of Extreme-Ultraviolet Lithography for 50 nm Generation

Li Yanqiu
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    Li Yanqiu. Optical Performance of Extreme-Ultraviolet Lithography for 50 nm Generation[J]. Acta Optica Sinica, 2004, 24(7): 865

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    Paper Information

    Category: Physical Optics

    Received: May. 30, 2003

    Accepted: --

    Published Online: May. 25, 2010

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