[1] [1] Zukic J M, Torr D G, Spann J F, et al. Vacuum ultraviolet thin films. 1: Optical constants of BaF2, CaF2, LaF3,MgF2, Al2O3, HfO2, and SiO2 thin films. Appl Opt, 1990,29 (28) :4284 ～ 4292

[2] [2] Kruschwitz, Traylor J D, Pawlewicz W T, et al. Optical and durability properities of infrared transmitting thin films. Appl Opt, 1997,36(21) :57 ～ 2159

[3] [3] Smith D, Baumeister P. Refractive index of some oxide and fluoride coating materials. Appl Opt, 1979,18(1): 111 ～ 115

[4] [4] Chow R, Falabella S, Loomis G E, et al. Reactive evaporation of low-defect hafnia. Appl Opt, 1993,32 (28):5567 ～ 5574

[5] [5] Alvisi M, Giulio M Di, Marrone S G, et al. HfO2 films with high laser damage threshold. Thin Sold Films, 2000,358(1-2) :250 ～ 258

[6] [6] Reicher D,Black P,Junglinhg K, et al. Defect formation in hafnium dioxide thin films. Appl Opt,2000,39 (10): 1589 ～1599

[7] [7] Macleod H A. Thin-Film Optical Filters. Third Edition,Institute of Physics Publishing Bristol and Philadelphia,2001

[8] [8] Ritala M, Leskela M, Niinisto L. Development of crystallinity and morphology in hafnium dioxide thin film grown by atomic layer epitaxy. Thin Solid Films, 1994,250(1-2) :72 ～80

[9] [9] JCPDS-International Center for Diffraction Data, 1999,PCPDFWIN V. 2.02, Present by Journal of Research of the National Institute of Standards and Technology

[10] [10] Kuo P K, Zhang S Y. A new diffraction theory for the mirage effect and thermal lensing. Progress in Natural Science, 1996,6(11): 191 ～ 205

[11] [11] ISO/DIS 11254 - 1.2 Optics and Optical instrumentslasers and laser related equipment-Test methods for laser induced damage threshold of optical surfaces-Part 1:1 on1 test,

[12] [12] Laser Induced Damage Threshold and Certification Procedures for Optical Materials, NASA Reference Publication 1395, June 1997, Available electronically at the following URL address: http://techreports.larc.nasa.gov/ltrs/ltrs.html