Challenges and recent advances in HfO2-based ferroelectric films for non-volatile memory applications

Ming-Hao Shao; Rui-Ting Zhao; Houfang Liu; Wen-Jia Xu; Yi-Da Guo; Da-Peng Huang; Yu-Zhe Yang; Xin-Ru Li; Wancheng Shao; Peng-Hui Shen; Junwei Liu; Kuanmao Wang; Jinguo Zheng; Zhao-Yi Yan; Jian-Lan Yan; Tian Lu; Yi Yang; Tian-Ling Ren

doi:10.1016/j.chip.2024.100101

Chip, Volume. 3, Issue 3, 100101(2024)

Challenges and recent advances in HfO2-based ferroelectric films for non-volatile memory applications

Ming-Hao Shao^1、†, Rui-Ting Zhao^1、†, Houfang Liu^†、*, Wen-Jia Xu, Yi-Da Guo, Da-Peng Huang, Yu-Zhe Yang, Xin-Ru Li, Wancheng Shao, Peng-Hui Shen, Junwei Liu, Kuanmao Wang, Jinguo Zheng, Zhao-Yi Yan, Jian-Lan Yan, Tian Lu, Yi Yang, and Tian-Ling Ren^**

Author Affiliations

School of Integrated Circuits and Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing 100084, China

show less

Figures & Tables(0)

Tools

Get Citation

Copy Citation Text

Ming-Hao Shao, Rui-Ting Zhao, Houfang Liu, Wen-Jia Xu, Yi-Da Guo, Da-Peng Huang, Yu-Zhe Yang, Xin-Ru Li, Wancheng Shao, Peng-Hui Shen, Junwei Liu, Kuanmao Wang, Jinguo Zheng, Zhao-Yi Yan, Jian-Lan Yan, Tian Lu, Yi Yang, Tian-Ling Ren. Challenges and recent advances in HfO2-based ferroelectric films for non-volatile memory applications[J]. Chip, 2024, 3(3): 100101

Download Citation

EndNote(RIS)BibTex Plain Text

Set citation alerts for article

Save article for my favorites

Paper Information

Category: Research Articles

Received: Apr. 8, 2024

Accepted: Jun. 11, 2024

Published Online: Nov. 12, 2024

The Author Email: Liu Houfang (houfangliu@tsinghua.edu.cn), Ren Tian-Ling (rentl@tsinghua.edu.cn)

DOI:10.1016/j.chip.2024.100101

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology