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Laser & Optoelectronics Progress, Volume. 57, Issue 15, 153101(2020)

Preparation of SixNy/SiO2 Hard Antireflection Film in Visible Light Band

Dongmei Liu1, Pengfei Yue1、*, Xiuhua Fu1, Hongyu Cao1, Jing Zhang1, and Shuang Li2
Author Affiliations
  • 1School of Optoelectronic Engineering, Changchun University of Science and Technology, Changchun, Jilin 130022, China
  • 2Optorun (shanghai) Co., Ltd., Shanghai 200444, China
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    Article index updated:May. 24, 2024

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    Dongmei Liu, Pengfei Yue, Xiuhua Fu, Hongyu Cao, Jing Zhang, Shuang Li. Preparation of SixNy/SiO2 Hard Antireflection Film in Visible Light Band[J]. Laser & Optoelectronics Progress, 2020, 57(15): 153101

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    Paper Information

    Category: Thin Films

    Received: Nov. 8, 2019

    Accepted: Dec. 5, 2019

    Published Online: Aug. 4, 2020

    The Author Email: Yue Pengfei (yuepengfeifilm@126.com)

    DOI:10.3788/LOP57.153101

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology