Researching | Background Light Suppression in Free Space Quantum Key Distribution

Laser & Optoelectronics Progress, Volume. 55, Issue 6, 060004(2018)

Background Light Suppression in Free Space Quantum Key Distribution

Qiuli Zhu, Lei Shi^*, Jiahua Wei, Yu Zhu, Ru Yang, and Guhao Zhao

Author Affiliations

Information and Navigation College, Air Force Engineering University, Xi'an, Shaanxi 710077, China

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Figures&Tables (9)

References (43)

Paper Information

Figures & Tables(9)

Fig. 1. Schematic of bit error sources in BB84 system

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Fig. 2. Atmospheric transmittance spectra

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Fig. 3. Solar radiation spectrum

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Fig. 4. Transmitting terminal in synchronization light method

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Fig. 5. Structural diagram of sender and receiver in classical BB84 system

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Fig. 6. Receiving terminal of B92 system based on Rb FADOF[42]

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Fig. 7. Working principle of FADOF

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Table 1. Parameter ratio between 800 nm and 1550 nm lights[37]

Table 1. Parameter ratio between 800 nm and 1550 nm lights[37]

Parameter	Atmospheretransmissivity	Solar radiationintensity	Mie scatteringcoefficient	Rayleigh scatteringcoefficient	Photon numberin horizontal plane	Photon numberin outer space
Ratio	0.82∶1	4.75∶1	1∶1	1∶0.07	2∶1	2.4∶1

Table 2. Parameter table for experimental system of free-space QKD
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Table 2. Parameter table for experimental system of free-space QKD
Year Wavelength /nm Filtertype FWHM /nm Transmissivity /% Distance /km Protocol Key rate /(bit·s^-1) Bit errorrate /%
2006 780 FADOF 0.01 60 0.23 B92 1930 4.77
2015 850 IF 5 - 20 BB84 145 4.5
2017 863 VBG 0.05 95 53 Decoy 400 3.19

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Qiuli Zhu, Lei Shi, Jiahua Wei, Yu Zhu, Ru Yang, Guhao Zhao. Background Light Suppression in Free Space Quantum Key Distribution[J]. Laser & Optoelectronics Progress, 2018, 55(6): 060004

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Paper Information

Category: Reviews

Received: Nov. 20, 2017

Accepted: --

Published Online: Sep. 11, 2018

The Author Email: Shi Lei (slfly2012@163.com)

DOI:10.3788/LOP55.060004

Topics

laser devices and laser physics

Lasers and Laser Optics

laser manufacturing

Instrumentation, Measurement and Metrology