To improve the focusing performance of hard X-ray focusing elements， a hard X-ray Compound Kinoform Lens (CKL) based on Polymethyl methacrylate (PMMA) with a depth of 60 μm is fabricated by LIGA( Lithographie， Galvanoformung， Abformung)technology， and its excellent morphology is obtained. The main structure of CKL is a narrow pattern with a few micron widths， including the curve and the rectangular surfaces， and the width of the narrowest pattern is only 2 μm. The fabrication of the CKL is divided into three parts to ensure its excellent morphology: the transitional mask preparation， LIGA mask preparation， and hard X-ray exposure to get the finial samples. The nanopillar arrays on silicon substrate are used to solve the falling-off problem of the photoresist during the LIGA mask preparation. Then the PMMA sample with a high molecular weight is selected as the substrate to improve the rigidity of the PMMA and to relieve the adhesion and collapse of the narrow pattern in the final sample preparation. The focusing performance of CKL is tested at X-ray microscope beam-line of Beijing Synchrotron Radiation Facility (BSRF). The experiment result for an 8 keV X-ray at transmission shows its full-width-at-half-maximum (FWHM) peak size for focusing spot is 440 nm.