Acta Optica Sinica, Volume. 31, Issue 2, 222003(2011)
Design of High Numerical Aperture Projection Objective for Industrial Extreme Ultraviolet Lithography
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Liu Fei, Li Yanqiu. Design of High Numerical Aperture Projection Objective for Industrial Extreme Ultraviolet Lithography[J]. Acta Optica Sinica, 2011, 31(2): 222003
Paper Information
Category: Optical Design and Fabrication
Received: May. 14, 2010
Accepted: --
Published Online: Jan. 30, 2011
The Author Email: Fei Liu (liufeicat@163.com)
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