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Chinese Optics Letters, Volume. 17, Issue 6, 061001(2019)

Adaptive window iteration algorithm for enhancing 3D shape recovery from image focus

Long Li1,2, Zhiyan Pan1, Haoyang Cui1, Jiaorong Liu1, Shenchen Yang1, Lilan Liu1,2, Yingzhong Tian1,2, and Wenbin Wang3、*
Author Affiliations
  • 1School of Mechatronic Engineering and Automation, Shanghai University, Shanghai 200072, China
  • 2Shanghai Key Laboratory of Intelligent Manufacturing and Robotics, Shanghai University, Shanghai 200072, China
  • 3Mechanical and Electrical Engineering School, Shenzhen Polytechnic, Shenzhen 518055, China
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    [1] Wei Fang, Kui Yang, Haiyuan Li, "Propagation-based incremental triangulation for multiple views 3D reconstruction," Chin.Opt.Lett. 19, 021101 (2021)

    [2] Qin Shu, Xiuli He, Chang Wang, Yunxiu Yang, "Parallel registration algorithm with arbitrary affine transformation," Chin.Opt.Lett. 18, 071001 (2020)

    [3] Zixiao Miao, Qican Zhang, "Dual-frequency fringe for improving measurement accuracy of three-dimensional shape measurement," Chin.Opt.Lett. 19, 102601 (2021)

    [4] Xin Yu, Shanshan Lai, Yuankun Liu, Wenjing Chen, Junpeng Xue, Qican Zhang, "Generic nonlinear error compensation algorithm for phase measuring profilometry," Chin.Opt.Lett. 19, 101201 (2021)

    Cited By

    [1] Jing Ye, Changhe Zhou, Junjie Yu, Yongfang Xie, Peng Sun. Two-dimensional picometer comb for three-dimensional reconstruction. Applied Optics, 59, 10547(2020).

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    Long Li, Zhiyan Pan, Haoyang Cui, Jiaorong Liu, Shenchen Yang, Lilan Liu, Yingzhong Tian, Wenbin Wang, "Adaptive window iteration algorithm for enhancing 3D shape recovery from image focus," Chin.Opt.Lett. 17, 061001 (2019)

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    Paper Information

    Category: Image processing

    Received: Sep. 14, 2018

    Accepted: Mar. 8, 2019

    Published Online: Jun. 5, 2019

    The Author Email: Wenbin Wang (wenbin_wang@126.com)

    DOI:10.3788/COL201917.061001

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology