[1] [1] M R Kozlowski, I M Thomas, J H Campbell, et al.. High-power optical coatings for a mega-joule class ICF laser [C]. SPIE, 1992, 1782: 105-119.

[2] [2] Andrius Melninkaitis, Arturas Vaninas, Julius Mirauskas, et al.. Laser conditioning of high reflectivity mirrors used in OPOs by 266 and 355 nm nanosecond pulses [C]. SPIE, 2009, 7504: 750408.

[3] [3] Zhan Meiqiong. Enhancement of the LIDT of optical coatings [J]. J Shanghai Second Polytechnic University, 2010, 27(4): 304-308.

[4] [4] Wei Chaoyang, Zhao Yuan′an, He Hongbo, et al.. Laser conditioning on optical thin film components [J]. Laser & Optoelectronics Progress, 2005, 42(5): 51-55.

[5] [5] Bu Yikun, Zhao Li, Zheng Quan, et al.. Design method of high damage threshold laser mirror [J]. Infrared and Laser Engineering, 2006, 35(2): 183-186.

[6] [6] Liu Xiaofeng, Li Dawei, Li Xiao, et al.. 1064 nm laser conditioning effect of HfO2/SiO2 high reflectors deposited by e-beam [J]. Chinese J Lasers, 2009, 36(6): 1545-1549.

[7] [7] C R Wolfe, M R Kozlowski, J H Campbell, et al.. Laser conditioning of optical thin films [C]. SPIE, 1989, 1438: 360-375.

[8] [8] Jebreel M Khoshman, Martin E Kordesch. Optical properties of a-HfO2 thin films [J]. Surface and Coatings Technology, 2006, 201(6): 3530-3535.

[9] [9] Robert Chow, Steve Falabella, Gray E Loomis, et al.. Reactive evaporation of low-defect density hafnia [J]. Appl Opt, 1993, 32(28): 5567-5574.

[10] [10] Li Xiao, Liu Xiaofeng, Shan Yongguang, et al.. Mechanism of laser-conditioning ZrO2-SiO2 high reflective thin film at 1064 nm [J]. Acta Optica Sinica, 2010, 30(8): 2284-2289.

[11] [11] Li Xiao, Liu Xiaofeng, Zhao Yuan′an, et al.. Influence of laser-conditioning on defects of SiO2 mono-layer films [J]. Chinese J Lasers, 2010, 37(6): 1626-1630.