Fig. 1. Refractive index n and band gap of ultraviolet thin film materials

Fig. 2. Transmittance of common materials in FUV

Fig. 3. Refractive index n and extinction coefficient k of MgF₂ obtained by ZUKIC M et al. using a least-squares method

Fig. 4. Refractive index n and extinction coefficient k of MgF₂ obtained by Tongji University

Fig. 5. Refractive index n and extinction coefficient k of MgF₂ obtained by MARCOS D R et al. using Kramers-Kronig

Fig. 6. Reflectivity of Al+MgF₂ mirrors

Fig. 7. Reflectivity of Al+eMgF₂ mirrors fabricated at varying substrate temperatures

Fig. 8. Reflectivity of Al+LiF+eMgF₂ mirrors stored in 20%，40% and 80% RH

Fig. 9. Reflectivity of Al+LiF mirrors at 110 nm

Fig. 10. Transmittance of narrowband （Al/MgF₂）^3 filters prepared by LARRUQUERT J I et al.

Fig. 11. Design and test results of （Al/MgF₂）ⁿ filter

Fig. 12. Reflectivity of narrowband LaF₃/MgF₂ multilayers fabricated by ZUKIC M et al

Fig. 13. Reflectivity of narrowband LaF₃/MgF₂ multilayer designed by WANG Xiaodong et al

Fig. 14. Reflectivity of narrowband LaF₃/MgF₂ multilayer fabricated by LÓPEZ-REYES P et al

Fig. 15. Reflectivity of narrowband LaF₃/MgF₂ multilayers fabricated by Tongji

Fig. 16. Reflectivity of Al+LiF+SiC+LiF fabricated by LARRUQUERT J I et al

Fig. 17. Reflectivity of Al+LiF+B₄C fabricated by Tongji University