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Optoelectronics Letters, Volume. 9, Issue 3, 189(2013)

Adjustment of residual stress and intermediate layer to BDD/porous Ti composite membrane

Cheng-lu TIAN... Xiao-wei LI* and Ming CHANG |Show fewer author(s)
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  • Tianjin Key Laboratory of Thin Film Electronic and Communication Devices, School of Electronics Information Engineering, Tianjin University of Technology, Tianjin 300384, China
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    TIAN Cheng-lu, LI Xiao-wei, CHANG Ming. Adjustment of residual stress and intermediate layer to BDD/porous Ti composite membrane[J]. Optoelectronics Letters, 2013, 9(3): 189

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    Paper Information

    Received: Dec. 25, 2012

    Accepted: --

    Published Online: Oct. 12, 2017

    The Author Email: Xiao-wei LI (lynnww@sohu.com)

    DOI:10.1007/s11801-013-2430-y

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology