High Power Laser and Particle Beams, Volume. 36, Issue 12, 126002(2024)
Plasma nitriding of depleted uranium
Figures & Tables(8)
Fig. 5. AES data of PSII sample and GDPN sample before and after wet heat corrosion
Fig. 6. Electrochemical polarization curves of HCPNsample, GDPN sample, PSII sample, and untreated sample
Table 1. Impurities of experimental materials
View tableView in ArticleTable 1. Impurities of experimental materials
experimental material impurity content/10−6 carbon nitrogen oxygen H2O others uranium 200 45 ＜150 nitrogen ＜3 ＜3 ＜5 ＜1
Table 2. Process parameters
View tableView in ArticleTable 2. Process parameters
process base presure/Pa voltage/ kV frequence/ kHz pulse width/μs current density/ (mA·cm−2) process time/h vacuum temperature/℃ PSII 8×10−4 50 0.4 40 ～0.1 2 220 GDPN 3×10−4 0.9 60 1.5 ～1 2 350 HCPN 3×10−4 0.6 60 0.5 ～20 2 130
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Zhong Long, Yabin Xue, Qingdong Xu, Lizhu Luo, Lei Lu, Yin Hu, Kezhao Liu. Plasma nitriding of depleted uranium[J]. High Power Laser and Particle Beams, 2024, 36(12): 126002
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Received: Sep. 13, 2024
Accepted: Oct. 25, 2024
Published Online: Jan. 15, 2025
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