To enhance the corrosion resistance of depleted uranium surfaces, a comparative analysis was conducted to evaluate the efficacy of three plasma nitriding technologies: Plasma Source Ion Implantation (PSII), Glow Discharge Plasma Nitriding (GDPN), and Hollow Cathode Plasma Nitriding (GDPN). The composition, structure and chemical state of the nitrided layers were analysed using a range of material analysis methods. The nitrides present in the three nitrided layers are predominantly α-U₂N₃. Due to the strong affinity between uranium metal and oxygen, all three plasma nitriding processes have introduced oxygen impurities to varying degrees. PSII is capable of breaking through the thermodynamic equilibrium and converting some of the oxides into nitrides, while GDPN and HCPN can form nitrides through surface reactions and thermal diffusion. HCPN technology has certain advantages in controlling the oxygen impurities, and can significantly reduce the oxygen impurities in the nitrided layer. The results of the wet heat corrosion and electrochemical tests demonstrate that plasma nitriding can markedly enhance the corrosion resistance of depleted uranium. The degree of improvement achieved by HCPN and GDPN is superior to that of PSII, with HCPN technology exhibiting the most favourable outcome. The findings of this study could provide a reference for plasma nitriding treatment of reactive metals..