Researching | Fabrication of 808 nm SQW Semiconductor Laser Facet AR HR Coating

Acta Photonica Sinica, Volume. 34, Issue 1, 25(2005)

Fabrication of 808 nm SQW Semiconductor Laser Facet AR HR Coating

[in Chinese]... [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese] and [in Chinese] |Show fewer author(s)

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References(2)

[1] [1] Ettenberg M.A new dielectric facet reflector for semicoductor lasers.Appl Phys Lett,1978,32(11):724～725

[2] [2] Giulio M D,Alvisi M,Perrone M R,et al.Laser damage testing of SiO2 and HfO2 thin films.SPIE,1999,3738: 337～346

CLP Journals

[1] LI Zai-jin, HU Li-ming, WANG Ye, YANG Ye, PENG Hang-yu, ZHANG Jin-long, QIN Li, LIU Yun, WANG Li-jun. Facet coating for 808 nm Al-containing semiconductor laser diodes[J]. Optics and Precision Engineering, 2010, 18(6): 1258

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Fabrication of 808 nm SQW Semiconductor Laser Facet AR HR Coating[J]. Acta Photonica Sinica, 2005, 34(1): 25

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Received: Jun. 18, 2004

Accepted: --

Published Online: Jun. 12, 2006

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Topics

laser devices and laser physics

Lasers and Laser Optics

laser manufacturing

Instrumentation, Measurement and Metrology