Optics and Precision Engineering, Volume. 30, Issue 18, 2232(2022)
Monte Carlo simulation and experiments of electron beam direct writing on curved
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Fig. 2. Simulation of absorption energy deposition density distributron （45°）
Fig. 5. Schematic diagram of calculating of absorption energy deposition density
Fig. 6. Map of the distribution of absorption energy deposition density with energies （0°）
Fig. 7. Map of the distribution of absorption energy deposition density with energies （15°）
Fig. 8. Map of the distribution of absorption energy deposition density with angles （
Fig. 9. Map of the distribution of absorption energy deposition density with angles （
Fig. 10. Map of the distribution of absorption energy deposition density with beam points （0°）
Fig. 11. Map of the distribution of absorption energy deposition density with beam points （15°）
Fig. 12. Map of the distribution of energy density with layers thickness（15°）
Table 1. Specific values of point exposure
View tableView in ArticleTable 1. Specific values of point exposure
变量 大小 长/nm 宽/nm 长宽比 入射
角度
5° 401.4 396 1.014 10° 356.9 320.4 1.114 15° 400.1 341.2 1.173 入射
能量
5 keV 274.6 188.4 1.458 10 keV 255.1 109.8 2.323 15 keV 320.2 109.5 2.924
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Mengtao XIE, Junbiao LIU, Pengfei WANG, Yulu ZHANG, Li HAN. Monte Carlo simulation and experiments of electron beam direct writing on curved[J]. Optics and Precision Engineering, 2022, 30(18): 2232
Paper Information
Category: Micro/Nano Technology and Fine Mechanics
Received: Jun. 7, 2022
Accepted: --
Published Online: Oct. 27, 2022
The Author Email: LIU Junbiao (liujb@mail.iee.ac.cn)
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