[1] [1] Konkola P T. Design and analysis of a scanning beam interference lithography system for patterning gratings with nanometer-level distortions［D］. Boston: Massachusetts Institute of Technology, 2003.

[2] [2] Montoya J. Toward nano-accuracy in scanning beam interference lithography［D］. Boston: Massachusetts Institute of Technology, 2006.

[3] [3] Chen C G. Beam alignment and image metrology for scanning beam interference lithography: fabricating gratings with nanometer phase accuracy［D］. Boston: Massachusetts Institute of Technology, 2003.

[4] [4] Jiang Shan, Bayanheshig, Song Ying, et al. Effect of measured interference fringe period error on groove profile of grating masks in scanning beam interference lithography system［J］. Acta Optica Sinica, 2014, 34(4): 0405003.

[5] [5] Song Ying, Bayanheshig, Qi Xiangdong, et al. Design of frequency-shift interference fringe locking system in holographic grating exposure［J］. Optics and Precision Engineering, 2014, 22(2): 318-324.

[6] [6] Jiang Shan, Bayanheshig, Li Wenhao, et al. Effect of period setting value on printed phase in scanning beam interference lithography system［J］. Acta Optica Sinica, 2014, 34(9): 0905003.

[7] [7] Han Jian. The research on the lithography system optimization and the grating mask profile parameters controlling in the fabrication of the holographic grating［D］. Beijing: Graduate University of Chinese Academy of Sciences, 2012.

[8] [8] Li Xiaotian, Qi Xiangdong, Yu Haili, et al. Yaw angel correction of grating line based on single piezoelectric actuator［J］. Optics and Precision Engineering, 2014, 22(8): 2039-2046.

[9] [9] Yang Chao, Yu Haili, Feng Shulong, et al. Influence of running accuracy of ruling carriage system on grating spectrum performance［J］. Optics and Precision Engineering, 2014, 22(10): 2674-2682.

[10] [10] Konkola P T, Chen C G, Heilmann R K, et al. Beam steering system and spatial filtering applied to interference lithography［J］. Journal of Vacuum Science and Technology B, 2000, 18(6): 3282-3286.

[11] [11] Bao Jianfei, Huang Lihua, Zeng Aijun, et al. Study on beam stabilization technique in lithography illumination system［J］. Chinese J Lasers, 2012, 39(9): 0908004.

[12] [12] Li Yao, Wang Ding, Guo Xiaoyang, et al. Fast and accurate laser beam automatic alignment system based on COMS sensor［J］. Chinese J Lasers, 2013, 40(9): 0916002.

[13] [13] Li Hong, Wang Dongfang, Zou Wei, et al. Design of high power laser beam automatic alignment system［J］. Chinese J Lasers, 2013, 40(10): 1002003.

[14] [14] Wei Pengfei, Liu Jun, Li Xiaofang, et al. Design of laser beam real-time monitoring and adaptive collimation system［J］. Acta Optica Sinica, 2008, 28(8): 1590-1595.

[15] [15] Li L F. Application of diffraction theory to analysis and fabrication of waveguide gratings［D］. Tucson: The University of Arizona, 1988.

[16] [16] Zhao Jinsong, Li Lifeng, Wu Zhenhua. Modeling of in-situ monitoring curves during development of holographic gratings［J］. Acta Optica Sinica, 2004, 24(8): 1146-1150.