Laser & Optoelectronics Progress, Volume. 52, Issue 8, 83101(2015)

1540 nm Photoluminescence Enhancement in Er Doped β-FeSi2/Si

He Jiuyang*, Ma Yuanyuan, Wan Ying, Aziguli·Reheman, and Aierken·Sidike
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    The high quality β-FeSi2/Si films whose surfaces are smooth and even on Si (1 1 1) are fabricated by pulsed laser deposition (PLD), and the sizes of β-FeSi2 nanocrystals are about 20~50 nm. Photoluminescence (PL) characteristics of hybrid β-FeSi2/Si films are investigated at low temperature (20 K). The β-FeSi2/Si films show a relatively PL peak at 1540 nm, which corresponds to the band-band recombination of β-FeSi2. Er3 + is doped into Si layer, and the β-FeSi2/Si∶Er shows increase of PL intensity and is a novel approach to decrease the nonradiative centers. The infrared emission of β-FeSi2/Si∶Er films originat from the stark of 4I13/2→4I15/2 in Er3+ and band-band recombination in β-FeSi2.

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    He Jiuyang, Ma Yuanyuan, Wan Ying, Aziguli·Reheman, Aierken·Sidike. 1540 nm Photoluminescence Enhancement in Er Doped β-FeSi2/Si[J]. Laser & Optoelectronics Progress, 2015, 52(8): 83101

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    Paper Information

    Category: Thin Films

    Received: Jan. 29, 2015

    Accepted: --

    Published Online: Aug. 10, 2015

    The Author Email: Jiuyang He (hejiuyang@sina.com)

    DOI:10.3788/lop52.083101

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