Laser & Optoelectronics Progress, Volume. 47, Issue 4, 41202(2010)

Measurement Errors in 632.8 nm High Precision Phase-Shifting Fizeau Interferometer

Wei Haoming1,2、*, Xing Tingwen1, Li Yun1,2, and Liu Zhixiang1
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  • 1[in Chinese]
  • 2[in Chinese]
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    To satisfy the need of nanometer measurement for high accuracy optical system,the design of nanometer measurement 632.8 nm phase-shifting Fizeau interferometer is presented. The elementary configuration and measuring principle of the 632.8 nm phase-shifting Fizeau interferometer to measure concave and convex surface are introduced. Some errors that affect the accuracy of interferometer are pointed out,including phase-shifting error,geometrical configuration induced error,vibration error and errors caused by CCD,laser source and fluctuating surroundings. The magnitude of measurement errors is obtained through analysis and simulation,among which phase-shifting error,geometrical configuration induced error,vibration error and fluctuating surroundings have great influence. Finally a group of system parameters and environment paraments for 632.8 nm phase-shifting Fizeau interferometer to realize nanometer measurement are given in theory.

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    Wei Haoming, Xing Tingwen, Li Yun, Liu Zhixiang. Measurement Errors in 632.8 nm High Precision Phase-Shifting Fizeau Interferometer[J]. Laser & Optoelectronics Progress, 2010, 47(4): 41202

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    Paper Information

    Category: Instrumentation, Measurement and Metrology

    Received: Mar. 8, 2009

    Accepted: --

    Published Online: Mar. 29, 2010

    The Author Email: Haoming Wei (weihaoming@163.com)

    DOI:10.3788/lop47.041202

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