Acta Optica Sinica, Volume. 30, Issue 1, 272(2010)
Influence of Buffer Layer on Performances of 1064 nm,532 nm Frequency-Doubled Antireflection Coating for LiB3O5
1064 nm,532 nm frequency-doubled antireflection coating with out buffer layer or with different buffer layers were fabricated by using electron beam evaporation technique on LBO. The optical property,adhesion and laser-induced damage threshold (LIDT) were investigated by Lambda900 spectrometer,MTS nano Indenter and Q-switched pulsed laser,respectively. The results showed that the reflectance of all samples was below 0.1% and 0.2% at wavelength of 1064 nm and 532 nm,respectively. Comparing with the sample without buffer layer,the critical adhesion of the sample with buffer layer of Al2O3 was increased by 43% and that of the coating with buffer layer of SiO2 was improved significantly. LIDT of the coatings were improved by using buffer layer of SiO2 and that of the coating with buffer layer of Al2O3 was decreased.
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Tan Tianya, Yu Hanjiang, Wu Wei, Guo Yongxin, Shao Jianda, Fan Zhengxiu. Influence of Buffer Layer on Performances of 1064 nm,532 nm Frequency-Doubled Antireflection Coating for LiB3O5[J]. Acta Optica Sinica, 2010, 30(1): 272
Category: Thin Films
Received: Oct. 7, 2008
Accepted: --
Published Online: Feb. 1, 2010
The Author Email: Tianya Tan (tantianya@126.com)