Laser & Optoelectronics Progress, Volume. 52, Issue 10, 100001(2015)
Status and Development of Scanning Beam Interference Lithography System
Scanning beam interference lithography (SBIL) is advantageous to produce large-area linear diffraction gratings that are phase-accuracy to nanometer level. In order to comprehend the merits of SBIL, the research progress on SBIL both in China and abroad are introduced, and the key technologies in SBIL are summarized from the merits and limitation of the scheme and principle. And then for the application of the specific grating, parameters of the key technologies in SBIL are presented. The development of SBIL is forecasted.
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Cheng Weilin, Zhu Jing, Zhang Yunbo, Zeng Aijun, Huang Huijie. Status and Development of Scanning Beam Interference Lithography System[J]. Laser & Optoelectronics Progress, 2015, 52(10): 100001
Category: Reviews
Received: Apr. 9, 2015
Accepted: --
Published Online: Oct. 8, 2015
The Author Email: Weilin Cheng (jiping111@163.com)