To test precisely the aspheric surface in a 90 nm nodal point lithography projecting lens, an Offner compensator with three pieces of lenses is presented based on the aberration theory. The equal quantity of spherical error is introduced to compensate all orders of aspheric coefficients and a certain quantity of axial spherical aberration is brought in to compensate the deviation of aspheric surface in a normal direction. The results indicate that primary and high order aberrations are balanced well,therefore the residual aberration is small enough.Furthermore, the design wavelength is 632.8 nm, the MTF exceeds diffraction limit,and the wavefront error(RMS) is less than λ/1 250.As the F-number can achieve 1.64 and the longitudinal aberration is lower than 0.47 μm, the system can satisfy the basic image formation condition. Finally, a loosen distribution of the tolerance is presented based on the accuracy of measuring apparatus. Analysis results show that the total residual wave aberration of the system is less than 0.007 27λ, which satisfies the requirement of assembling accuracy.