Laser & Optoelectronics Progress, Volume. 54, Issue 11, 113103(2017)

Effect of Film Micro-Structure of Tungsten Oxide Films Deposited by Magnetron Sputtering on Electrochromic Performance

Chu Wenjing1、*, Zhang Xiqiang1, Shi Xiayu1, Zheng Youwei1, Lin Junliang1, Chen Mingyi1, Lin Jinxi1, Lin Jinhan1, and Yuan Ningyi2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    By the magnetron sputtering method, the tungsten oxide (WO3) films are prepared under different working pressures. The regulating effect of working pressure on WO3 film microstructure is studied, and the effect of WO3 film microstructure on its electrochromic performance is also investigated. The study results show that the prepared WO3 film is with an amorphous phase and its surface presents a peak-shaped structure. With the increase of working pressure, the WO3 film microstructure becomes loose, and the electrochromic response time and the cycle lifetime are shorten. Under the optimal film microstructure condition, the optical density of WO3 films is 0.64 and the cycle lifetime is up to 1500 cycles.

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    Chu Wenjing, Zhang Xiqiang, Shi Xiayu, Zheng Youwei, Lin Junliang, Chen Mingyi, Lin Jinxi, Lin Jinhan, Yuan Ningyi. Effect of Film Micro-Structure of Tungsten Oxide Films Deposited by Magnetron Sputtering on Electrochromic Performance[J]. Laser & Optoelectronics Progress, 2017, 54(11): 113103

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    Paper Information

    Category: Thin Films

    Received: May. 25, 2017

    Accepted: --

    Published Online: Nov. 17, 2017

    The Author Email: Wenjing Chu (wjchu@czamd.com)

    DOI:10.3788/lop54.113103

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