Laser & Optoelectronics Progress, Volume. 54, Issue 11, 113103(2017)
Effect of Film Micro-Structure of Tungsten Oxide Films Deposited by Magnetron Sputtering on Electrochromic Performance
By the magnetron sputtering method, the tungsten oxide (WO3) films are prepared under different working pressures. The regulating effect of working pressure on WO3 film microstructure is studied, and the effect of WO3 film microstructure on its electrochromic performance is also investigated. The study results show that the prepared WO3 film is with an amorphous phase and its surface presents a peak-shaped structure. With the increase of working pressure, the WO3 film microstructure becomes loose, and the electrochromic response time and the cycle lifetime are shorten. Under the optimal film microstructure condition, the optical density of WO3 films is 0.64 and the cycle lifetime is up to 1500 cycles.
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Chu Wenjing, Zhang Xiqiang, Shi Xiayu, Zheng Youwei, Lin Junliang, Chen Mingyi, Lin Jinxi, Lin Jinhan, Yuan Ningyi. Effect of Film Micro-Structure of Tungsten Oxide Films Deposited by Magnetron Sputtering on Electrochromic Performance[J]. Laser & Optoelectronics Progress, 2017, 54(11): 113103
Category: Thin Films
Received: May. 25, 2017
Accepted: --
Published Online: Nov. 17, 2017
The Author Email: Wenjing Chu (wjchu@czamd.com)