Journal of Synthetic Crystals, Volume. 49, Issue 11, 2200(2020)

Growth Behavior of AlN Single Crystal

CHENG Hongjuan1,*... JIN Lei2, WU Honglei2, QI Haitao1, WANG Zenghua1, SHI Yuezeng1 and ZHANG Li1 |Show fewer author(s)
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  • 1[in Chinese]
  • 2[in Chinese]
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    In this paper, the morphologies of AlN crystals prepared by the physical vapor transport method under different substrate temperatures and temperature differences were studied. The results show that the growth of AlN crystal is affected by the surface energy of AlN, the average kinetic energy of Al element and the polarity of AlN surface. When the temperature difference is 60 ℃, the growth rate of the (0001) plane of AlN crystal is lower than that of the (10-10) crystal plane, and the AlN belts are observed. Applying the processes to bulk AlN crystal growth, the (0001) surface of AlN crystal exhibites a domain growth mode as the temperature difference at 60 ℃, and the crystal quality is the worst; the (0001) surface of AlN crystal presentes a step flow growth mode as the temperature difference at 35 ℃, and the crystal quality is the best; the (0001) surface of AlN crystal shows a step cluster growth mode as the temperature difference at 20 ℃, and the crystal is easy to crack. AlN substrate with a diameter of 40 mm was finally obtained by process optimization which meets the requirements of device preparation.

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    CHENG Hongjuan, JIN Lei, WU Honglei, QI Haitao, WANG Zenghua, SHI Yuezeng, ZHANG Li. Growth Behavior of AlN Single Crystal[J]. Journal of Synthetic Crystals, 2020, 49(11): 2200

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    Paper Information

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    Received: --

    Accepted: --

    Published Online: Jan. 26, 2021

    The Author Email: Hongjuan CHENG (xiemn08@126.com)

    DOI:

    CSTR:32186.14.

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