Acta Optica Sinica, Volume. 13, Issue 10, 940(1993)
1:1 optics for UV or DUV lithography
The design of a new kind of UV or DUV lithography lenses is described in this paper. Compared with other UV or DUV lithography lenses, this lens can meet the needs of higher numerical aperture and full use of its field. Using the ring illumination, this lens can provide a solution for the contradiction of shortening DOF while enlarging NA.
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[in Chinese], [in Chinese], [in Chinese]. 1:1 optics for UV or DUV lithography[J]. Acta Optica Sinica, 1993, 13(10): 940
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