Chinese Journal of Lasers, Volume. 40, Issue 9, 907001(2013)
Realization of Antireflection Coatings for 193 nm P-Polarized Light at Large Angle
The substrate and layer materials used for the antireflection coatings at 193 nm range are calculated and analyzed, and the deposition technique and parameters are carefully chosen and optimized. Based on these analyses the antireflection coatings for 193 nm light at large incident angle are designed, fabricated and tested. The results show that after coating, the residual reflection is lower than 1% and the single transmission of the coating is higher than 96% when the incident angle is 68°~72°. The single round trip energy loss of the linewidth narrowing module is calculated before coating and after coating, which confirms the necessity of this antireflection coating.
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Li Chun, Jin Chunshui, Jin Jingcheng, Chang Yanhe. Realization of Antireflection Coatings for 193 nm P-Polarized Light at Large Angle[J]. Chinese Journal of Lasers, 2013, 40(9): 907001
Category: materials and thin films
Received: Feb. 27, 2013
Accepted: --
Published Online: Aug. 27, 2013
The Author Email: Chun Li (lifshu1012@aliyun.com)