Chinese Optics Letters, Volume. 12, Issue 9, 092301(2014)

GaN-based p–i–n ultraviolet photodetectors with a thin p-type GaN layer on patterned sapphire substrates

Hongjuan Huang1, Dawei Yan1, Guosheng Wang2, Feng Xie2, Guofeng Yang1, Shaoqing Xiao1, and Xiaofeng Gu1
Author Affiliations
  • 1Key Laboratory of Advanced Process Control for Light Industry (Ministry of Education), Department of Electronic Engineering, Jiangnan University, Wuxi 214122, Jiangsu, China
  • 2The 38th Research Institute of China Electronics Technology Group Corporation, Hefei 230088, China
  • show less

    We study the performance of GaN-based p–i–n ultraviolet (UV) photodetectors (PDs) with a 60 nm thin p-type contact layer grown on patterned sapphire substrate (PSS). The PDs on PSS exhibit a low dark current of ~2 pA under a bias of -5 V, a large UV/visible rejection ratio of ~7×103, and a high-quantum efficiency of ~40% at 365 nm under zero bias. The average quantum efficiency of the PDs still remains above 20% in the deep-UV region from 280 to 360 nm. In addition, the noise characteristics of the PDs are also discussed, and the corresponding specific detectivities limited by the thermal noise and the low-frequency 1/f noise are calculated.

    Tools

    Get Citation

    Copy Citation Text

    Hongjuan Huang, Dawei Yan, Guosheng Wang, Feng Xie, Guofeng Yang, Shaoqing Xiao, Xiaofeng Gu. GaN-based p–i–n ultraviolet photodetectors with a thin p-type GaN layer on patterned sapphire substrates[J]. Chinese Optics Letters, 2014, 12(9): 092301

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category:

    Received: Apr. 18, 2014

    Accepted: Jun. 3, 2014

    Published Online: Aug. 21, 2014

    The Author Email:

    DOI:10.3788/col201412.092301

    Topics