Acta Optica Sinica, Volume. 16, Issue 6, 833(1996)
Fabrication Errors Analysis and Simulation of Binary Optical Element
In this paper, the analytic expression of diffraction efficiency corresponding to the mask etch-depth errors is deduced from the scale diffraction theory. Choosing 4-step and 8-step blazed grating as an example, we simulated systematically main registeringetch errors and their interactions of binary optical element using computer. The results of computer simulation agree well with that of the analytic method. It can provide theoretical basis and experiment parameter for practical fabrication.
Get Citation
Copy Citation Text
[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Fabrication Errors Analysis and Simulation of Binary Optical Element[J]. Acta Optica Sinica, 1996, 16(6): 833