Ablation Characteristics of C<sub>60</sub>Face by 308 nm Excimer Laser

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Acta Optica Sinica, Volume. 15, Issue 7, 909(1995)

Ablation Characteristics of C₆₀Face by 308 nm Excimer Laser

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]

Author Affiliations

[in Chinese]

show less

Abstract Get PDF(in Chinese)

The ablation rate and etch threshold of the C60 film are measured by using 308urn excimer laser.The effect of O2gas on the ablation characteristics are discussed.

Keywords

C60 film laser ablation excimer laser

Tools

Get Citation

Copy Citation Text

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Ablation Characteristics of C₆₀Face by 308 nm Excimer Laser[J]. Acta Optica Sinica, 1995, 15(7): 909

Download Citation

EndNote(RIS)BibTex Plain Text

Set citation alerts for article

Save article for my favorites

Paper Information

Category: Thin Films

Received: Jun. 9, 1994

Accepted: --

Published Online: Aug. 17, 2007

The Author Email:

DOI:

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology