One-dimensional and two-component Cu/Ti superlattice films have been deposited by DC magnetron sputtering. The influences of substrate temperature, periodic number and substrate structure on UV-reflectivity of Cu/Ti superlattic films are studied. The films fabricated at 470 ℃ substrate temperature, on Si(100) substrate and with 30 pair layers have a high UV-reflectivity of about 90% at 200 nm and 5° from normal incidence.