Laser & Optoelectronics Progress, Volume. 59, Issue 9, 0922001(2022)
Computational Lithography Technology Under Chip Manufacture Context
Computational lithography technology plays crucial roles in enhancing resolution. It bridges the gap between chip design and manufacturing processes. In this study, first, rule-based optical proximity correction (OPC) was introduced as the first generation of OPC and the origin of computational lithography. Second, model-based OPC, source mask cooperation, and double patterning technology were introduced under the 14-nm IC manufacturing context. Finally, the trend of computational lithography was discussed and inverse lithography technology, curvilinear masks, AI-based OPCs, and holistic process optimizations were introduced. Integrated optimization of chip design, manufacturing and inspection offers broad prospects for computational lithography.
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Weijie Shi, Zongqiang Yu, Junhai Jiang, Yongqiang Che, Sikun Li. Computational Lithography Technology Under Chip Manufacture Context[J]. Laser & Optoelectronics Progress, 2022, 59(9): 0922001
Category: Optical Design and Fabrication
Received: Mar. 18, 2022
Accepted: Apr. 7, 2022
Published Online: May. 10, 2022
The Author Email: Shi Weijie (weijie.shi@dfjy-jx.com)