Acta Optica Sinica, Volume. 34, Issue 6, 622001(2014)
Computer-Aided Alignment for the Lithographic Lens
Computer-aided alignment technology is introduced into the alignment of the lithographic lens and mathematical model is established for strict image quality requirements of lithographic lens. The 4th to 37th terms of fringe zernike polynomials and distortion are selected as corrected objects and 19 structural parameters are selected as compensators. The data of sensitivity matrix and image quality are acquired by combing macros of CODE V with Matlab. Singular value decomposition is proposed to calculate the weighted least-squares compensation amount. The Zernike coefficients or distortion of different field is improved by weight factor. The wavefront root mean square difference is about 0.004λ and the average distortion difference is about 1 nm between compensated objective and designed objective. The wavefront aberration and distortion are basically recovered to the design level.
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Zhao Feifei, Tang Jianyu, Huang Wei, Xu Weicai. Computer-Aided Alignment for the Lithographic Lens[J]. Acta Optica Sinica, 2014, 34(6): 622001
Category: Optical Design and Fabrication
Received: Dec. 12, 2013
Accepted: --
Published Online: Apr. 23, 2014
The Author Email: Feifei Zhao (guangdianfeifei@126.com)