Laser & Optoelectronics Progress, Volume. 59, Issue 9, 0922003(2022)
Research Progress on Stage Control Methods for a Lithography Machine
A lithography machine is a key equipment to support the continuous reduction of the size of the integrated circuit. High-performance lithography machine requires high-acceleration and high-precision motion stages. To meet the requirements of the lithography machine, high-performance stage control methods are essential. This paper sorts out and introduces the mainstream control methods of motion stages in the lithography machine. First, the working principle and basic control structure of motion stages are introduced. Then, the control methods of the motion stage are introduced in detail from the aspects of feedforward control, feedback control and over-actuation/over-sensing, to provide a reference for the further development of control methods of lithography machine motion stages.
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Longbin Jiang, Runze Ding, Chenyang Ding, Xiaofeng Yang, Yunlang Xu. Research Progress on Stage Control Methods for a Lithography Machine[J]. Laser & Optoelectronics Progress, 2022, 59(9): 0922003
Category: Optical Design and Fabrication
Received: Feb. 8, 2022
Accepted: Mar. 21, 2022
Published Online: May. 10, 2022
The Author Email: Ding Chenyang (dingcy@fudan.edu.cn), Yang Xiaofeng (xf_yang@fudan.edu.cn)