Acta Optica Sinica, Volume. 39, Issue 2, 0231001(2019)
Encapsulation Structure of Gradient Refractive Index with Ultralow Reflectance
SiO2 with gradient refractive index is fabricated via inductively-coupled plasma enhanced chemical vapor phase deposition (ICP-PECVD) technology at room temperature, and the relation between fabrication technology and optical characteristics of SiO2 material is studied. The antireflective characteristic of perovskite cells encapsulated by SiO2 with gradient refractive index is simulated by utilizing the results of ellipsometry analysis. It is found that the perovskite cells show an ultra-low reflectance, which reaches 0.5% at 550 nm. This research provides an alternative way to realize low-temperature encapsulation of perovskite cells with considering optical properties.
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Guojun Jin, Kai Xu, Jun Tan, Lingli Wang, Yanlong Meng. Encapsulation Structure of Gradient Refractive Index with Ultralow Reflectance[J]. Acta Optica Sinica, 2019, 39(2): 0231001
Category: Thin Films
Received: Jul. 20, 2018
Accepted: Sep. 17, 2018
Published Online: May. 10, 2019
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