Chinese Journal of Quantum Electronics, Volume. 32, Issue 6, 673(2015)
Fabrication ofanatase TiO2 film by KrF pulse laser annealing
TiO2 thin films of about 200 nm thickness were prepared by RF magnetron sputtering on quartz substrates at room temperature,and then annealed by a KrF pulse laser with wavelength 248 nm under different power densities in the air. The effect of laser power density on the characteristics of films was systematically analyzed using X-ray diffractometry(XRD),Raman spectra,X-ray photoelectron spectroscopy(XPS),scanning electron microscopy(SEM),atom force microscopy(AFM),high resolution transmission electron microscopy(HRTEM) and selected area electron diffraction(SAED) and UV-vis spectrophotometer. The results showed that high-quality anatase TiO2 films can be obtained when the power density was 0.5 J/cm2. By increasing the power density continually,TiO2 showed the predominant orientation with rutile phase along(1 1 0) reflection,with roughness of the films increasing.
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ZHANGZifeng, ZHANG Zhiwei, HONG Rongdun, CHEN Xiaping, WU Zhengyun. Fabrication ofanatase TiO2 film by KrF pulse laser annealing[J]. Chinese Journal of Quantum Electronics, 2015, 32(6): 673
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Received: Apr. 10, 2015
Accepted: --
Published Online: Dec. 18, 2015
The Author Email: ZHANGZifeng (chuzhouxiadahao@163.com)