In the present work, five films on the surface of pure titanium were formed by microarc oxidation technique at various applied voltages: 300, 350, 400, 450 and 500 V. The phase component and microstructure of these films were analyzed by scanning electron microscopy and Raman spectroscopy. The result shows that the surface of the films is covered by numerous micropores. With the increase in applied voltage, the size of these micropores increases, but the density of these micropores declines. These films consist of anatase and rutile phases, and the phase component of the film is closely related to the applied voltage. In the condition of lower applied voltage, the film is mainly composed of anatase phase. With increasing the applied voltage, the content of rutile phase increases, and when the applied voltage ranges from 400 to 450 V, the rutile phase increases sharply and becomes domain phase.