The design and manufacturing of interferometric exposure systems with high wave-front flatness and structural stability is a paramount condition for development of high-quality holographic diffraction gratings. A ray-tracing was carried out on straightness of the interference fringes arisen from four kinds of interferometric exposure systems of Single Reflective Mirrors (SLR),namely, off-axis parabolic/Lloyd mirror system, single lens/Lloyd mirror system, spherical mirror/Lloyd mirror system and the separation of pairs of lens/Lloyd mirror system. A standard grating was placed in the interferometric field to make two parallel light beams for exposure incident on the grating, so that the diffractive light was superpositioned to appear Moire fringes.Then, the Moire fringes metioned above were simulated.The Zernike polynomial was used to fit the Moire fringes to get wavefront aberration of interferometric exposure systems and to compare the differrences among the four systems. The results show that the off-axis parabolic/Lloyd mirror system is the most appropriate in production of small-caliber plane holographic gratings. On that basis, the off-axis parabolic/Lloyd mirror interferometric exposure system was manufactured to fabricate plane holographic gratings with a maximum size of 110 mm×110 mm and the engraved linear density greater than 1200 l/mm.The diffraction grating wave-front aberration produced by the plane holographic grating is 0.239 6λ (λ = 550 nm) ,as the mirror face accuracy aberration between off-axis parabolic mirror and Lloyd mirror is λ / 8 (λ = 632.8 nm).This system can be used to produce plane holographic gratings with wave-front aberration in λ/6-λ/7(λ=550 nm), if the external disturbance is overcome and finely tuned.