The design process of holographic waveguide display system is usually divided into grating design and waveguide design,which is unintuitive and incapable for machining error analysis.Therefore,we propose a new comprehensive method for holographic waveguide design,which analyzes the diffraction process and transmission process of light synthetically.Taking the 2-D exit-pupil expander holographic waveguide display system as an example,analysis is made to the error caused by the waveguide wedge and grating parameters.In addition,their influence on imaging quality is also analyzed.This analysis method can provide the required accuracy for manufacture process.