Chip, Volume. 3, Issue 1, 100074(2024)

Sensing with extended gate negative capacitance ferroelectric field-effect transistors

Honglei Xue1,†... Yue Peng2,†, Qiushi Jing1, Jiuren Zhou2, Genquan Han2,* and Wangyang Fu1,** |Show fewer author(s)
Author Affiliations
  • 1Key Laboratory of Advanced Materials (MOE), School of Materials Science and Engineering, Tsinghua University, Beijing 100084, China
  • 2School of Microelectronics, Xidian Univeristy, Xi'an 710071, China
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    With major signal analytical elements situated away from the measurement environment, extended gate (EG) ion-sensitive field-effect transistors (ISFETs) offer prospects for whole chip circuit design and system integration of chemical sensors. In this work, a highly sensitive and power-efficient ISFET was proposed based on a metal–ferroelectric–insulator gate stack with negative capacitance–induced super-steep subthreshold swing and ferroelectric memory function. Along with a remotely connected EG electrode, the architecture facilitates diverse sensing functions for future establishment of smart biochemical sensor platforms.

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    Honglei Xue, Yue Peng, Qiushi Jing, Jiuren Zhou, Genquan Han, Wangyang Fu. Sensing with extended gate negative capacitance ferroelectric field-effect transistors[J]. Chip, 2024, 3(1): 100074

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    Paper Information

    Category: Research Articles

    Received: Aug. 23, 2023

    Accepted: Nov. 13, 2023

    Published Online: Jan. 23, 2025

    The Author Email: Han Genquan (gqhan@xidian.edu.cn), Fu Wangyang (fwy2018@mail.tsinghua.edu.cn)

    DOI:10.1016/j.chip.2023.100074

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