Journal of Synthetic Crystals, Volume. 53, Issue 12, 2094(2024)

Efficient Polishing Process of Diamond in Oxygen-Enriched Environment and Its Material Removal Mechanism

LIU Shuaiwei1...2, GUAN Chunlong1,*, LU Yunxiang2, YI Jian2, JIANG Nan2 and KAZUHITO Nishimura2 |Show fewer author(s)
Author Affiliations
  • 1School of Materials Science and Engineering, Henan University of Technology, Zhengzhou 450001, China
  • 2Zhejiang Key Laboratory of Marine Materials and Protection Technology, Key Laboratory of Marine Materials and Related Technologies, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China
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    Diamond is an excellent material for applications in acoustics, optics, electronics, and thermal management. However, their extremely low material removal rate results in very long processing durations. Therefore, it is essential to improve polishing efficiency while maintaining excellent polishing quality. In this study, a comparative experiment on the polishing of polycrystalline diamonds using diamond wheels under normal and oxygen-enriched environments has been conducted. It is found that the material removal rate reaches 2.29 μm/h under oxygen-enriched environment, which is over nine times the removal rate of 0.25 μm/h under normal condition, while maintaining good surface quality. The characterization results of atomic force microscopy indicate that, within a 30 μm×30 μm measurement area, the surface roughness Sa of the polished diamond under the oxygen-enriched environment could reach below 2 nm. Meanwhile, scanning electron microscopy (SEM) and transmission electron microscopy (TEM) observations reveal no significant structural damage. Furthermore, the material removal mechanism during diamond polishing was analyzed by X-ray photoelectron spectroscopy (XPS), the results indicate that the diamond during polishing undergoes a phase transition from sp3 to sp2 structures under mechanical action, with the resultant phase transition layer being removed under both mechanical and oxidative effects. Additionally, it is observed that in the oxygen-enriched environment, the phase transition layer is removed more rapidly, indicating that oxidation plays a more significant role in the diamond material removal process.

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    LIU Shuaiwei, GUAN Chunlong, LU Yunxiang, YI Jian, JIANG Nan, KAZUHITO Nishimura. Efficient Polishing Process of Diamond in Oxygen-Enriched Environment and Its Material Removal Mechanism[J]. Journal of Synthetic Crystals, 2024, 53(12): 2094

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    Paper Information

    Category:

    Received: Aug. 14, 2024

    Accepted: Jan. 10, 2025

    Published Online: Jan. 10, 2025

    The Author Email: Chunlong GUAN (chunlong_@haut.edu.cn)

    DOI:

    CSTR:32186.14.

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