Acta Optica Sinica, Volume. 38, Issue 8, 0815021(2018)

Phase Measurement Profilometry Based on Binary Gratings with Unequal Duty Cycle

Yuting Chen*, Yiping Cao*, Cheng Chen, Yingying Wan, Guangkai Fu, Yapin Wang, and Lu Wang
Author Affiliations
  • College of Electronics and Information Engineering, Sichuan University, Chengdu, Sichuan 610065, China
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    The phase measurement profilometry (PMP) based on binary gratings with an unequal duty cycle is proposed. The adopted binary gratings have only two grayscales of 0 and 255, and the effect of the gamma nonlinearity on the grayscale of the sinusoidal grating is eliminated. At the same time, the refresh frequency of the projection system can be increased by an order of magnitude. The measurement accuracy of this proposed method is higher than that of the Roach grating defocus projection Fourier transform profilometry and the repeat accuracy is higher than that of the traditional PMP based on sinusoidal gratings.

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    Yuting Chen, Yiping Cao, Cheng Chen, Yingying Wan, Guangkai Fu, Yapin Wang, Lu Wang. Phase Measurement Profilometry Based on Binary Gratings with Unequal Duty Cycle[J]. Acta Optica Sinica, 2018, 38(8): 0815021

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    Paper Information

    Category: Machine Vision

    Received: Mar. 22, 2018

    Accepted: May. 10, 2018

    Published Online: Sep. 6, 2018

    The Author Email:

    DOI:10.3788/AOS201838.0815021

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