Dual-dressed four-wave mixing and dressed six-wave mixing in a five-level atomic system

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

doi:10.3788/COL20080609.0685

Chinese Optics Letters, Volume. 6, Issue 9, 685(2008)

Dual-dressed four-wave mixing and dressed six-wave mixing in a five-level atomic system

[in Chinese]¹, [in Chinese]¹, [in Chinese]¹, [in Chinese]¹, [in Chinese]^1,2, [in Chinese]¹, [in Chinese]², [in Chinese]¹, and [in Chinese]³

Author Affiliations

¹Key Laboratory for Physical Electronics and Devices of the Ministry of Education, Xi’an Jiaotong University, Xi’an 710049

²Department of Physics, University of Arkansas, Fayetteville, Arkansas 72701, USA

³State Key Laboratory of Transient Optics and Technology, Xi’an Institute of Optics and Precision Mechanics, Chinese Academy of Sciences, Xi’an 710068

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We study the co-existing four-wave mixing (FWM) process with two dressing fields and the six-wave mixing (SWM) process with one dressing field in a five-level system with carefully arranged laser beams. We also show two kinds of doubly dressing mechanisms in the FWM process. FWM and SWM signals propagating along the same direction compete with each other. With the properly controlled dressing fields, the FWM signals can be suppressed, while the SWM signals have been enhanced.

Keywords

030.1670 190.4380 270.4180 300.2570 320.7110

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Dual-dressed four-wave mixing and dressed six-wave mixing in a five-level atomic system[J]. Chinese Optics Letters, 2008, 6(9): 685

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Paper Information

Received: Feb. 18, 2008

Accepted: --

Published Online: Sep. 11, 2008

The Author Email:

DOI:10.3788/COL20080609.0685

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology