Chinese Optics Letters, Volume. 4, Issue 3, 03170(2006)

DC discharge characteristics and fluorine atom yield in NF3/He

Liping Duo*, Shukai Tang, Haijun Yu, Jian Wang, Xiangde Min, Liucheng Li, Yuqi Jin, Bailing Yang, and Fengting Sang
Author Affiliations
  • Short Wavelength Chemical Laser Laboratory, Dalian Institute of Chemical Physics, Chinese Academy of Sciences, Dalian 116023
  • show less

    DC discharge characteristics of NF3/He have been investigated experimentally under different experimental conditions, for example, different electrode materials, separations, flow rates of the gas NF3 or He, and series resistances. The optimum discharge parameters and the fluorine atom yield from the DC discharge of NF3/He as function of load power are studied experimentally.

    Tools

    Get Citation

    Copy Citation Text

    Liping Duo, Shukai Tang, Haijun Yu, Jian Wang, Xiangde Min, Liucheng Li, Yuqi Jin, Bailing Yang, Fengting Sang. DC discharge characteristics and fluorine atom yield in NF3/He[J]. Chinese Optics Letters, 2006, 4(3): 03170

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category:

    Received: Aug. 22, 2005

    Accepted: --

    Published Online: Jun. 6, 2006

    The Author Email: Liping Duo (dlp@dicp.ac.cn)

    DOI:

    Topics