VOx thin films are deposited on K9 polished glass substrate by RF magnetron sputtering at various oxygen partial pressures. The surface profiler is used to measure the thickness and deposition rate, and the X ray diffraction is employed to detect the crystalline structure of the films. Surface morphology of the films is observed by afomic force microscopy (AFM). Transmittance spectra of the films are measured by the spectroscopy in the range from ultraviolet to near infrared. It is indicated that the VOx thin films take on crystalline state with different phases, and adjusting oxygen partial pressures can get optical films with weak absorption from visible to near infrared region, but high oxygen partial pressures go against with deposition rate of the films. Oxygen partial pressures have the influence of different degrees on the surface roughness and crystal growth pattern of the films.