Chinese Optics Letters, Volume. 3, Issue 5, 05302(2005)

Research on OEF geometry control algorithm in dual-galvanometric laser scanning manufacturing

Huilai Sun1,2、*, Shuzhong Lin1,2, and Tao Wang2,3
Author Affiliations
  • 1School of Mechanical and Electronic Engineering, Tianjin Polytechnic University, Tianjin 300160
  • 2College of Mechanical Engineering, Hebei University of Technology, Tianjin 300130
  • 3Institute of laser and Optoelectrics, Tianjin University, Tianjin 300072
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    For the dual-galvanometric laser scanning manufacturing, the traditional geometry algorithm-fθ only considered the distance between the two swaying mirrors, the distance between the swaying mirror and the convex lens, the mirror swaying angle, and the lens focal length. And it could not correctly express the manufacturing track which was made geometry distorted. Based on analysis, a creative geometry control algorithm --- optical entire factors (OEF) was brought forward. From the creative algorithm it can be known that OEF geometry control algorithm was concerned with not only the distance of the two swaying mirrors, distance between the swaying mirror and the convex lens, mirror swaying angle, and lens focal length, but also the lens central height, lens convex radius, and medium refractive index. The manufacturing system can manufacture satisfied geometry with the creative double ends approach (DEA) control model based on OEF in the experiments.

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    Huilai Sun, Shuzhong Lin, Tao Wang. Research on OEF geometry control algorithm in dual-galvanometric laser scanning manufacturing[J]. Chinese Optics Letters, 2005, 3(5): 05302

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    Paper Information

    Category: Optical Design and Fabrication

    Received: Jun. 29, 2004

    Accepted: --

    Published Online: Jun. 6, 2006

    The Author Email: Huilai Sun (jear@webmail.hebut.edu.cn)

    DOI:

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