Chinese Optics Letters, Volume. 2, Issue 1, 0104(2004)

Laser writing system for fabrication of diffractive optics elements

Xiaohui Sun1,2、*, Changhe Zhou1, Huayi Ru1, Yanyan Zhang1, and Bingkun Yu2
Author Affiliations
  • 1Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800
  • 2College of Science, Shanghai University, Shanghai 200436
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    We report a laser writing system for fabrication of diffractive optical elements with He-Cd laser. The wavelength of the light source is 441.6 nm. The output beam is collimated into parallel light with uniform intensity distribution after passing through the spatial filter with a pinhole of 25 um and the collimating device. A microscopy objective lens with numerical aperture (NA) of 0.65 is used to focus the beam into a small diffraction spot. Any pattern can be written with this system. Experimental results are presented. The written gratings and the phase patterns were verified with a conventional optical microscopy and the Taylor Hobson equipment.

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    Xiaohui Sun, Changhe Zhou, Huayi Ru, Yanyan Zhang, Bingkun Yu. Laser writing system for fabrication of diffractive optics elements[J]. Chinese Optics Letters, 2004, 2(1): 0104

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    Paper Information

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    Received: Sep. 4, 2003

    Accepted: --

    Published Online: Jun. 6, 2006

    The Author Email: Xiaohui Sun (sxh111@hotmail.com)

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