Acta Optica Sinica, Volume. 7, Issue 11, 1036(1987)
A two-layer dielectric AR film and its application in semiconductor opto -electrical devices
This paper gives a theoretical study on the design method of the anti-reflection (AR) film for traveling wave semiconductor laser amplifiers (TWSLA). A two-dimensional digital integration is used to calculate the optimum film parameters and their allowable errors for TiO2/SiO2 AR film coated on the facets of the 1.3μ InGaAsP lasers. Such films are successfully fabricated by using the vacuum coating and two-wavelen th control technique. The reflectivity of the is lower than 3.9×10-4. By means of the AR film, we succeeded in achieving the direct amplifioatiaa for tbe optical signal and in increasing the sensitivities of PIN & APD detectors.
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HUANG DEXIU, LIU DEMING, FAN CHENGJUN. A two-layer dielectric AR film and its application in semiconductor opto -electrical devices[J]. Acta Optica Sinica, 1987, 7(11): 1036