A method for characterization of thin-film damage by using laser-induced breakdown spectroscopywas propose. The innate infromation of plasma spectrum when film damaged under the nanosecond pulse laser irradiation was investigated. In experiment, the temperature and electronic density of plasma were seperately 2807.4K and7.4×1017cm-3when the HfO2 film was irradiated by 78mJ laser energy.And whether the film was damaged or not has been identified exactly through identifying the characteristics of the plasma spectrum, which avoid the phenomenon of misjudgement. The results shows that the application of laser-induced breakdown spectroscopy is fully applicable to the measurement of laser damage of the films, and is a highly effective method of test analysis on thin-film laser damage.