Acta Optica Sinica, Volume. 26, Issue 5, 746(2006)
Arrays of Narrow Bandpass Filters Fabricated by Combinatorial Etching Technique
The basic mechanism and fabrication processes of the combinatorial etching technique have been introduced. It is a high-efficiency technique for the integration of narrow bandpass filters (NBPFs). A filter array integrated with 2N NBPFs can be fabricated with only N times of etching processes, and the technique can be applied in different wavelength regions. The experimental results of the array integrated with 32 filters in the visible-NIR and the array integrated with 16 filters in the MIR have been demonstrated. The pass-bands of the former NBPFs distribute linearly in the range of 774.7~814.2 nm. All the filters' full widths at half maximum (FWHM) are very narrow and less than 1.5 nm, corresponding to δλ/λ of each filter less than 0.2%. The narrowest FWHM of the integrated filters comes to 0.8 nm with δλ/λ of 0.1% at the wavelength of 794.3 nm. The transmittances of the pass-bands are between 21.2% and 32.4%. Most of them are near 30%.
Get Citation
Copy Citation Text
[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Arrays of Narrow Bandpass Filters Fabricated by Combinatorial Etching Technique[J]. Acta Optica Sinica, 2006, 26(5): 746