Acta Optica Sinica, Volume. 17, Issue 1, 117(1997)
Submicron Projection Lithography with Second Harmonic Light of Copper Vapor Laser
In order to study the feasibility of submicron lithography using second harmonic light of a copper vapor laser(CVL), a 1∶1 catadioptric projection lens, and an illumination system which consists of a rotating diffuser and a ligth pipe, are designed and constructed. A resolution of 0.6 μm line/space patterns is produced in AZ1350 resist. The result shows that the second harmonic light of CVL can be used as an illumination source in submicron lithography.
Keywords
Tools
Get Citation
Copy Citation Text
[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Submicron Projection Lithography with Second Harmonic Light of Copper Vapor Laser[J]. Acta Optica Sinica, 1997, 17(1): 117
Paper Information
© Copyright 2018-2021 | Chinese Laser Press.
All Rights Reserved 沪ICP备15018463号-20